发明名称 FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a field effect transistor that dispenses with the alignment among a gate electrode, a source electrode, and a drain electrode, and can obtain both of a high on/off ratio and high-speed operation even if finishing dimensions deviate, and to provide a method for manufacturing the field effect transistor. SOLUTION: In the field effect transistor having the source electrode 2 and the drain electrode 3 via an insulating layer 5 and an active layer 4 on the gate electrode 1, a recessed groove in an inverted trapezoidal shape is formed at the surface section of the active layer 4, and the source electrode 2 and the drain electrode 3 are formed on one inclined plane and the other inclined one of the recessed groove in an inverted trapezoidal shape, respectively. As its manufacturing method, the recessed groove in an inverted trapezoidal shape is formed by selectively removing one portion of the active layer, resin is formed so that the active layer including the recessed groove is covered, and only resin at the inclined plane section of the recessed groove in an inverted trapezoidal shape is removed, for example, by ashing the resin, thus forming the source and drain electrodes at the inclined plane section. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005340409(A) 申请公布日期 2005.12.08
申请号 JP20040155598 申请日期 2004.05.26
申请人 CANON INC 发明人 NUMAI TAKAAKI
分类号 H01L21/28;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/28
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