IMMERSION LIQUID FOR IMMERSION EXPOSURE PROCESS AND METHOD FOR FORMING RESIST PATTERN USING SUCH IMMERSION LIQUID

摘要

In an immersion exposure process, particularly in such an immersion exposure process wherein the resolution of a resist pattern in improved by performing an exposure while having a liquid with a certain thickness which has a higher refractive index than air intervene at least on a resist film in the path through which a lithography exposure light reaches the resist film, deterioration of the resist film and deterioration of the liquid in use during the immersion exposure are prevented at the same time, thereby enabling to form a high resolution resist pattern through immersion exposure. A liquid composed of a silicon-based liquid which is transparent to the exposure light used for the exposure process is used as an immersion liquid for the immersion exposure.