发明名称 Apparatus for forming a semiconductor thin film
摘要 Disclosed are apparatus for forming a semiconductor film having an excellent crystallinity from a non-single crystal semiconducting layer formed on a base layer made of an insulating material. The apparatus includes a light source, a homogenizer for homogenizing an intensity distribution of the emitted light, an amplitude-modulation means for performing the amplitude-modulation such that the amplitude of the light, of which the intensity distribution is homogenized, is increased in the direction of the relative motion of the light to the base layer, an optional light projection optical system for projecting the amplitude-modulated light onto the surface of the non-single crystal semiconductor such that a predetermined irradiation energy can be obtained, a phase shifter for providing a low temperature point in the surface irradiated by the light, and a substrate stage to move the light relative to the substrate thereby enabling scanning in the X and Y axis.
申请公布号 US2005272274(A1) 申请公布日期 2005.12.08
申请号 US20050198656 申请日期 2005.08.05
申请人 KABUSHIKI KAISHA EKISHO SENTAN GIJUTSU KAIHATSU CENTER 发明人 MATSUMURA MASAKIYO;NISHITANI MIKIHIKO;KIMURA YOSHINOBU;JYUMONJI MASAYUKI;TANIGUCHI YUKIO;HIRAMATSU MASATO;NAKANO FUMIKI
分类号 B23K26/06;C30B1/00;C30B13/00;C30B13/24;H01L21/20;H01L21/268;(IPC1-7):H01L21/26 主分类号 B23K26/06
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