发明名称 |
Micro electrical mechanical system (MEMS) tuning using focused ion beams |
摘要 |
A method for tuning an electro-mechanical device such as a MEMS device is disclosed. The method comprises operating a MEMS device in a depressurized system and using FIB micromachining to remove a portion of the MEMS device. Additionally, a method for tuning a plurality of MEMS devices by depositing an active layer and then removing a portion of the active layer using FIB micromachining. Also, a method for tuning a MEMS device and vacuum packaging the MEMS device in situ are provided.
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申请公布号 |
US2005269901(A1) |
申请公布日期 |
2005.12.08 |
申请号 |
US20050148389 |
申请日期 |
2005.06.07 |
申请人 |
HRL LABORATORIES, LLC |
发明人 |
KUBENA RANDALL L.;JOYCE RICHARD J. |
分类号 |
H03H3/007;(IPC1-7):H01L41/04 |
主分类号 |
H03H3/007 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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