发明名称 PATTERN FORMING METHOD, COLOR FILTER MANUFACTURING METHOD, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY
摘要 <p>A pattern forming method for forming a fine pattern with high definition while improving the productivity of the pattern formation and for forming a predetermined pattern on a photosensitive composition with high resolution. The method comprises a photosensitive layer forming step of forming a photosensitive layer on the surface of a base using a photosensitive compound containing, a binder, a polymerizable compound, and a photopolymerization initiator, a step of modulating light from light illuminating means by means of light modulating means having n element drawing sections which receives at least light from the light illuminating means and outputs light and exposing the photosensitive layer formed at the photosensitive layer forming step in a lean-oxygen atmosphere by light passing through a microlens array where microlenses having an aspherical surface for correcting the aberration due to the distortion of the exit surface at the element drawing sections are arrayed or to light passing through a microlens array where microlenses having a lens aperture shape preventing light from around the element drawing sections from entering, and a development step for developing the photosensitive layer exposed to light at the exposure step.</p>
申请公布号 WO2005116775(A1) 申请公布日期 2005.12.08
申请号 WO2005JP09967 申请日期 2005.05.31
申请人 FUJI PHOTO FILM CO., LTD.;IWASAKI, MASAYUKI;ISHIKAWA, HIROMI;SHIMOYAMA, YUJI;KODAMA, TOMOHIRO 发明人 IWASAKI, MASAYUKI;ISHIKAWA, HIROMI;SHIMOYAMA, YUJI;KODAMA, TOMOHIRO
分类号 G02B3/00;G02B5/20;G03F7/00;G03F7/004;G03F7/20;H01L21/027;(IPC1-7):G03F7/20 主分类号 G02B3/00
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