发明名称 PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To easily form a good black matrix pattern having high linearity and free of peeling and residue in the color filter of a liquid crystal display. <P>SOLUTION: In a photosensitive composition, a photopolymerization initiator contains a compound shown by formula (I) and a triazine compound. Since these compounds are contained, the photosensitive composition has enhanced sensitivity to light and the development margin of a pattern increases, accordingly even when the photosensitive composition contains a light shielding material, a pattern having good linearity and free of peeling and residue can easily be formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005338328(A) 申请公布日期 2005.12.08
申请号 JP20040155655 申请日期 2004.05.26
申请人 TOKYO OHKA KOGYO CO LTD 发明人 SHINODA MASARU;UCHIGAWA KIYOSHI
分类号 G03F7/031;G02B5/00;G02B5/20;G02F1/1335;G03F7/004 主分类号 G03F7/031
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