Electrical fuses as programmable data storage

摘要

An electrical fuse is disclosed. It is formed by a silicide layer on a polysilicon layer, with a first dielectric section separating the electrical fuse from a semiconductor substrate and a second dielectric section separating the electrical fuse from at least one electrical conductor directly above the fuse. The polysilicon layer is at least 2000 Angstroms in thickness and no more than 0.14 um in width and the second dielectric section contains substantially low-K materials.