发明名称 |
BOAT FOR SILICON WAFER HEAT TREATMENT |
摘要 |
PROBLEM TO BE SOLVED: To obtain a boat for silicon wafer heat treatment which will not require troublesome operation and which will not store metal contamination. SOLUTION: Groove type wafer supporting stepped parts 2a are formed on respective supporting columns 2 in order to support the peripheral part of a silicon wafer. An annular upper plate 1 with the same outer diameter as that of a lower plate 3 is fixed to the other end side of respective supporting column 2. The attaching position of the upper plate 1 is lower than the upper end of respective supporting columns 2 by a length corresponding to about 5 pieces of the groove type wafer supporting stepped part 2a, for example. A dummy wafer is mounted on the groove type wafer supporting stepped part 2a positioned above the upper plate 1. COPYRIGHT: (C)2006,JPO&NCIPI |
申请公布号 |
JP2005340597(A) |
申请公布日期 |
2005.12.08 |
申请号 |
JP20040159029 |
申请日期 |
2004.05.28 |
申请人 |
TOSHIBA CERAMICS CO LTD |
发明人 |
SUDO HARUO;ARAKI KOJI;SEI MOTOHIRO |
分类号 |
H01L21/683;H01L21/02;H01L21/22;H01L21/31;H01L21/68;(IPC1-7):H01L21/22 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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