发明名称 |
MASK MAKING METHOD, MASK MAKING DEVICE, AND MASK DRAWING DEVICE |
摘要 |
Laser light in a pattern reflected by a two-dimensional array micromirror 106 that is controlled on the basis of mask data of a mask pattern data output device 107 forms an enlarged pattern 110. This enlarged pattern is projected in a reduced manner onto a mask substrate 109 through a reduction-projection optical system 102, thereby forming a lithography pattern 111. Since a large number of patterns are written in an instant by the two-dimensional array micromirror 106, a time required for lithography the entire mask pattern is extremely shortened as compared with a conventional one. As a result, the mask cost can be largely reduced. <IMAGE>
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申请公布号 |
EP1602974(A1) |
申请公布日期 |
2005.12.07 |
申请号 |
EP20040705928 |
申请日期 |
2004.01.28 |
申请人 |
BALL SEMICONDUCTOR INC.;OHMI, TADAHIRO |
发明人 |
OHMI, TADAHIRO;SUGAWA, SHIGETOSHI;TAKEHISA, KIWAMU |
分类号 |
G03F7/20;(IPC1-7):G03F1/08;H01L21/027 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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