发明名称 AlGalnN single-crystal wafer
摘要 AlGaInN single-crystal wafer with alleviated cracking and improved utilization rate and cost effectiveness. A hexagonal AlxGayIn1-(x+y)N (0 < x ≤ 1, 0 ≤ y < 1, x + y ≤ 1) single-crystal wafer, characterized in that the wafer has a thickness T (cm) and a principal face with a surface area S (cm<2>), the area S and thickness T satisfying the conditions S ≥ 10 cm<2> and 0.006S ≥ T ≥ 0.002S. <IMAGE>
申请公布号 EP1602752(A1) 申请公布日期 2005.12.07
申请号 EP20050011927 申请日期 2005.06.02
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 FUJIWARA, SHINSUKE
分类号 C30B23/00;H01L21/02;C30B29/40;(IPC1-7):C30B29/40 主分类号 C30B23/00
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