发明名称 ELECTROLYTIC COPPER FOIL
摘要 <p>An object of the present invention is to provide a copper foil having excellent adhesion to an etching resist layer, without performing physical polishing such as buffing in pre-treatment of an etching process to form a circuit from the copper foil. To attain the object, in electroforming, a titanium material having a grain size number of 6.0 or more is employed as a copper deposition surface of the rotating drum cathode, and glue and/or gelatin is added in an amount of 0.2-20 mg/l to a copper sulfate solution, thereby producing a drum foil. An electrodeposited copper foil obtained from the drum foil, wherein 20% or more of the crystals present in a shiny side surface of the electrodeposited copper foil have a twin-crystal structure, is used for producing copper-clad laminates. &lt;IMAGE&gt;</p>
申请公布号 EP1167580(A4) 申请公布日期 2005.12.07
申请号 EP20000977944 申请日期 2000.11.27
申请人 MITSUI MINING & SMELTING CO., LTD. 发明人 NAKANO, OSAMU;KATAOKA, TAKASHI;TAENAKA, SAKIKO;UCHIDA, NAOHITO;HANZAWA, NORIKO
分类号 C25D1/04;C25D3/38;H05K1/09;(IPC1-7):C25D1/04 主分类号 C25D1/04
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