发明名称 Device and method for connecting two wafers in a planar manner for grinding down and cutting up a product wafer
摘要 A device for connecting two wafers in a planar manner for grinding down and cutting up a product wafer has a vacuum chamber, a chuck for receiving a carrier wafer, a heating device for heating up the chuck and a vacuum-chamber cover with a vacuum-holding device, on which a product wafer can be arranged suspended above the carrier wafer. After the evacuation of the vacuum chamber, the active surface of the product wafer is dropped onto a double-sided adhesive film on the carrier wafer and is pressed into place by the rising pressure during air admission. The result is that the wafers are connected together.
申请公布号 US6972069(B2) 申请公布日期 2005.12.06
申请号 US20030403877 申请日期 2003.03.31
申请人 INFINEON TECHNOLOGIES AG 发明人 HECHT FRANZ;KROENINGER WERNER;LUTZKE MELANIE
分类号 H01L21/00;H01L21/683;(IPC1-7):B29C65/48;G11B7/24;G11B7/26 主分类号 H01L21/00
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