| 发明名称 |
Extreme ultraviolet radiation imaging |
| 摘要 |
An extreme (EUV) lithography system includes optical elements which vary the wavelengths of radiation as a function of the angle of incidence on a mask to maximize the reflected radiation intensity.
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| 申请公布号 |
US6972419(B2) |
申请公布日期 |
2005.12.06 |
| 申请号 |
US20030373415 |
申请日期 |
2003.02.24 |
| 申请人 |
INTEL CORPORATION |
发明人 |
TEJNIL EDITA |
| 分类号 |
G01N21/88;G01N21/956;G03F7/20;G21G5/00;G21K1/06;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/88 |
| 代理机构 |
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