发明名称 Polishing silicon wafers
摘要 An endless belt for a belt type polishing machine comprises a support fabric and a polymer layer of relatively low hardness. The polymer layer is formed with drainage grooves. The support fabric may comprise a non woven or woven material, or a membrane with oriented reinforcing yarns. A further version comprises a spiral-link fabric supporting a woven or non woven layer carrying the polymer layer. The polymer layer may be a double layer, the upper of which is either harder or softer than the lower layer.
申请公布号 US6971950(B2) 申请公布日期 2005.12.06
申请号 US20030689678 申请日期 2003.10.22
申请人 PRAXAIR TECHNOLOGY, INC. 发明人 DUDOVICZ WALTER
分类号 B24B37/00;B24B21/04;B24B37/04;B24D11/06;H01L21/304;(IPC1-7):B24B21/04 主分类号 B24B37/00
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