| 摘要 |
<p>The present invention provides a composition for preparing porous dielectric thin film containing pore-generating material, said composition comprising gemini detergent, fourth alkylammonate, thermo-stable organic or inorganic matrix precursor, and solvent for dissolving said two solid components. There is also provided an interlayer insulating film having good mechanical property such as hardness, modulus and hydroscopicity, which is required for semiconductor devices.</p> |
