| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition giving a reduced fluctuation range of resist pattern width, having high sensitivity to radiation and exhibiting excellent etching resistance, and a copolymer suitably employable for the resin composition. <P>SOLUTION: The copolymer comprises a unit represented by formula (1) (wherein R<SP>1</SP>is a hydrogen atom or a monovalent organic group; and n is a natural number of 1-3) and a unit represented by formula (2) (wherein R<SP>2</SP>is a hydrogen atom or a monovalent organic group; and a and b are each a natural number of 1-3). The radiation-sensitive resin composition comprises the copolymer. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
