发明名称 MOLD AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a mold which is used for obtaining a molding having a protective wall provided around a molding surface with a transferred mold pattern and where the mold pattern is formed by using photolithography and an etching technology, and its manufacturing method. SOLUTION: In this mold for obtaining the molding having the protective wall provided around the molding surface with the transferred mold pattern, a base with an outer peripheral contour corresponding to an inner peripheral contour is formed on a substrate, and a layer, where the mold pattern is formed on a surface by using the photolithographic and etching technologies, is formed on the base. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005329685(A) 申请公布日期 2005.12.02
申请号 JP20040152459 申请日期 2004.05.21
申请人 SONY CORP 发明人 SATO HITOSHI;SAEKI YUKITAKE;NIKAIDO MEGUMI
分类号 B29C33/38;B29L11/00;(IPC1-7):B29C33/38 主分类号 B29C33/38
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