Cylindrical magnetron for sputtering,申请号KR20050025691U-传众专利搜索

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发明名称	Cylindrical magnetron for sputtering
摘要
申请公布号	KR200402621(Y1)	申请公布日期	2005.12.02
申请号	KR20050025691U	申请日期	2005.09.06
申请人		发明人
分类号	H01F41/14;(IPC1-7):H01F41/14	主分类号	H01F41/14
代理机构		代理人
主权项
地址

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