PLASMA TREATMENT METHOD AND APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a structure of an electrode having a high plasma generation efficiency and a means (manner) for voltage application to the electrode.

SOLUTION: A plurality of objects to be treated are arranged at intervals in a magazine and installed in a chamber; paired electrodes to which high-frequency electric power in different frequency bands is applied are arranged on the opposite to each other in both side faces of the magazine in the chamber; further gas supply ports for supplying a gas toward the electrodes are formed in at least two parts outside of both electrodes in the chamber; gas discharge adjustment ports are formed in at least two parts in two approximately center directions of the chamber; the gas gotten in plasma state by the electrodes is supplied to the objects to be treated from both side faces; and gas currents are generated toward the both side face directions from the gas supply direction to carry out plasma treatment under uniform gas flow in both of the front and the rear faces of the objects to be treated.

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