发明名称 FORMING METHOD OF MULTILAYER WIRING AND MANUFACTURING METHOD OF MULTILAYER WIRING SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To form a multilayer wiring with a simple method without giving damage to the wiring or a device. <P>SOLUTION: The forming method of the multilayer wiring with the structure of a lower layer wiring connected to an upper layer wiring is provided with a first process for forming a stud bump, a second process for forming an insulating layer on the stud bump a third process for forming a via-hole, arriving at the stud bump through laser work, and a fourth process for forming a via wiring filled into the via-hole and the upper layer wiring connected to the via wiring. In this case, the stud bump is employed as the stopper layer of laser when the via-hole is formed. <P>COPYRIGHT: (C)2006,JPO&NCIPI</p>
申请公布号 JP2005332887(A) 申请公布日期 2005.12.02
申请号 JP20040148165 申请日期 2004.05.18
申请人 SHINKO ELECTRIC IND CO LTD 发明人 HARUHARA MASAHIRO;MURAYAMA HIROSHI;AZUMA MITSUTOSHI
分类号 H05K3/28;H01L23/12;H05K3/00;H05K3/46;(IPC1-7):H05K3/46 主分类号 H05K3/28
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