| 摘要 |
<P>PROBLEM TO BE SOLVED: To suppress occurrence of back transfer or to prevent back transfer from becoming a problem even if the back transfer occurs when exposing a substrate through which light is permeated. <P>SOLUTION: A projecting portion 2, a bank 3 and a suction hole 4 are provided on the substrate holding face of a substrate chuck 1. When a substrate is mounted on the substrate chuck 1, the project 2 supports the substrate at a plurality of points. The bank 3 divides a space which is formed between the portion of the substrate holding face other than the project 2 and the substrate, into a plurality of vacuum blocks. Air in each of the vacuum blocks is released from the suction hole 4, so that the substrate is adsorbed and fixed on the substrate chuck 1. Treatment for reducing a light reflection factor is applied to the substrate holding face of the substrate chuck 1, and occurrence of back transfer is suppressed. Furthermore, the bank 3 is comprised of irregular lines. Even if back transfer occurs, it is hardly recognized by human eyes and does not become a problem. <P>COPYRIGHT: (C)2006,JPO&NCIPI |
