发明名称 MULTI-LAYER STRUCTURE EXCELLENT IN INTERLAYER PEELING RESISTANCE
摘要 PROBLEM TO BE SOLVED: To provide a laminated structure which finds out a polyamide resin of an adherend having especially excellent interlayer adhesive properties when a polyester adhesive resin indicating excellent adhesive properties to the polyamide resin is used, remarkably improves interlayer peeling resistance in the interface between the polyamide resin and an adhesive resin, is excellent in interlayer peeling resistance between inner and outer layers of a polyester resin and an intermediate layer of the polyamide resin, suppresses yellowing and the increase of haze, and is excellent in hygienic properties, mechanical strength, and gas-barrier properties. SOLUTION: In the multi-layer structure excellent in interlayer peeling resistance, the inner and outer layers of the polyester resin, the intermediate layer of the polyamide resin formed between the inner and outer layers, and an adhesive resin layer of an acid-modified polyester adhesive resin formed on the interface between the inner and outer layers and the intermediate layer are provided, and the polyamide resin has a terminal amino group concentration of at least 30×10<SP>-6</SP>eq/g. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005329627(A) 申请公布日期 2005.12.02
申请号 JP20040150173 申请日期 2004.05.20
申请人 TOYO SEIKAN KAISHA LTD;MITSUBISHI CHEMICALS CORP 发明人 KITANO YOSHIHIRO;YAMADA TOSHIKI;KIKUCHI ATSUSHI;NAKAGAWA ATSUSHI;OMORI MASATOSHI
分类号 B32B27/34;B32B27/36;(IPC1-7):B32B27/34 主分类号 B32B27/34
代理机构 代理人
主权项
地址