| 摘要 |
PROBLEM TO BE SOLVED: To provide a length measuring method and a length measuring device using an electron beam capable of uniquely specifying a pattern position of a secondary electron image to be measured with appropriate precision even if the measuring objective pattern as a sample is a part of a pattern constructed of repeatedly arranged unit patterns. SOLUTION: Pattern matching processing evaluating a degree of pattern matching with a position specifying pattern is carried out over the whole display area of the secondary electron image (SEM image) obtained by scanning the sample by electron beams. Total evaluation performing point evaluation totally by taking a point PM(i) of this pattern matching degree evaluation and a point PL(i) of position evaluation into consideration is carried out. From the respective candidate patterns selected according to a point TE(i) of the total evaluation on respective candidate patterns PTi (i = 1 to N), one pattern is selected as a pattern for the secondary electron image matching the position specifying pattern, and based on the position of the secondary electron image, the position of the secondary electron image to be measured is decided, and then, its length is measured. COPYRIGHT: (C)2006,JPO&NCIPI
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