发明名称 |
Process and assembly to treat semiconductor wafer in liquid etching bath with inner wall and outer wall |
摘要 |
<p>In a semiconductor manufacturing process the wafers are placed on a horizontal rotating shaft in a treatment bath. Each shaft has a regular series of locating notches and a drive system. Each shaft end is supported by a ball bearing unit within an upright panel forming part of the outer housing wall. An independent claim is given for a semiconductor treatment process.</p> |
申请公布号 |
DE102005028167(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
DE20051028167 |
申请日期 |
2005.06.17 |
申请人 |
SILTRONIC AG |
发明人 |
BIRKHORST, PETER;SCHWAB, GUENTER;STADLER, MAXIMILIAN |
分类号 |
C30B33/08;C30B33/10;H01L21/00;H01L21/306;(IPC1-7):C30B33/08 |
主分类号 |
C30B33/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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