| 发明名称 |
Lithographic apparatus |
| 摘要 |
Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
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| 申请公布号 |
US2005263068(A1) |
申请公布日期 |
2005.12.01 |
| 申请号 |
US20040966110 |
申请日期 |
2004.10.18 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HOOGENDAM CHRISTIAAN A.;STREEFKERK BOB;MULKENS JOHANNES CATHARINUS H.;BIJLAART ERIK THEODORUS M.;KOLESNYCHENKO ALEKSEY Y.;LOOPSTRA ERIK R.;MERTENS JEROEN JOHANNES SOPHIA M.;SLAGHEKKE BERNARDUS A.;TINNEMANS PATRICIUS ALOYSIUS J.;VAN SANTEN HELMAR |
| 分类号 |
G03F7/20;B05C11/00;G03B27/42;G03B27/52;H01L21/00;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/20 |
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