发明名称 |
Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods |
摘要 |
An apparatus for adjusting an etching area of a semiconductor wafer includes an adjustable shielding plate. The adjustable shielding plate includes a plurality of shielding members. Each of the plurality of shielding members are movable between a first position configured to shield a portion of a semiconductor wafer from an etching gas and a second position configured to expose an unshielded etching portion of the semiconductor wafer to the etching gas.
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申请公布号 |
US2005263484(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
US20050119490 |
申请日期 |
2005.04.29 |
申请人 |
PARK JONG-CHUL;JEONG SANG-SUP |
发明人 |
PARK JONG-CHUL;JEONG SANG-SUP |
分类号 |
H01L21/3065;G01L21/30;H01J37/32;H01L21/00;H01L21/02;(IPC1-7):G01L21/30 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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