| 摘要 |
A method of cleaning at least one surface of an optical device disposed in a vacuum chamber, which is at least partially contaminated by atoms and/or ions of metalloid and/or metal introduced by a radiation source generating, in particular, extreme ultraviolet radiation and/or 10 soft X-rays is described. In order to achieve a longer service life for the optical device (14), the method is designed such that a temperature prevailing on the surface (10) and/or a pressure in the vacuum chamber (12) is adjusted in such a way that the atoms and/or ions (20) hitting the surface (10) can move upon it. |
