发明名称 |
Composition for forming anti-reflective coating film, anti-reflective coating film composed of the composition, and method of forming resist pattern using the composition |
摘要 |
The composition for forming an anti-reflective coating film of the present invention has a hard-volatility and high coating performance. In particular, when the 193 nm ArF excimer laser beam source is applied, the composition exhibits a higher etching property. Therefore, the composition is suitably for forming an anti-reflective coating film with no voids and for a method of forming resist patterns using the composition. The composition for forming an anti-reflective coating film comprising; (A) a hard-volatility light absorbing compound, (B) siloxanepolymer, and (C) a solvent.
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申请公布号 |
US2005267277(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
US20050131205 |
申请日期 |
2005.05.18 |
申请人 |
TAKAHAMA MASARU;SAKAMOTO YOSHINORI;TANAKA TAKESHI;YAMASHITA NAOKI |
发明人 |
TAKAHAMA MASARU;SAKAMOTO YOSHINORI;TANAKA TAKESHI;YAMASHITA NAOKI |
分类号 |
G03F7/11;C08G77/26;G03F7/004;G03F7/075;H01L21/027;(IPC1-7):C08G77/26 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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