CHEMICAL LIQUID FEEDING APPARATUS AND METHOD FOR FEEDING THEREFORE

摘要

A system and method of supplying continuous chemical to a processing area for use in manufacturing a semiconductor device are provided. First and second storage vessels store chemical. A sensor checks and senses whether conduits respectively connected with the first and second storage vessels are empty. A 3-way valve selectively connects the conduits respectively connected with the first and second storage vessels, with a conduit connected to the processing area, so that chemical of the first and second storage vessels can be selectively supplied to the process area. A controller controls the 3-way valve in response to outputs of the first and second sensors. A pump is installed on a conduit for connecting the 3-way valve to the processing area and provides a flow pressure to the chemical.