发明名称 |
POLYIMIDE RESIN, MULTILAYER FILM, MULTILAYER FILM WITH METAL LAYER, AND SEMICONDUCTOR DEVICE |
摘要 |
<p>Disclosed is a polyimide resin having a glass transition temperature of 200-320˚C and containing a siloxane diamine residue, a fluorene diamine residue and a specific tetracarboxylic acid dianhydride residue at certain ratios. Also disclosed is a novel polyimide resin composition having high solubility in organic solvents and excellent heat resistance. Further disclosed are a multilayer film and multilayer film with metal layer having high adhesiveness and solder heat resistance, and a highly reliable semiconductor device using such a multilayer film with metal layer.</p> |
申请公布号 |
WO2005113645(A1) |
申请公布日期 |
2005.12.01 |
申请号 |
WO2005JP07766 |
申请日期 |
2005.04.25 |
申请人 |
TORAY INDUSTRIES, INC.;WATANABE, TAKUO |
发明人 |
WATANABE, TAKUO |
分类号 |
B32B15/08;B32B27/34;C08G73/10;H05K1/03;(IPC1-7):C08G73/10 |
主分类号 |
B32B15/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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