发明名称 Method of patterning a film
摘要 A method of patterning a thin film. The method includes forming a mask on a film to be patterned. The film is then etched in alignment with the mask to form a patterned film having a pair of laterally opposite sidewalls. A protective layer is formed on the pair of laterally opposite sidewalls. Next, the mask is removed from above the patterned film. After removing the mask from the patterned film, the protective layer is removed from the sidewalls.
申请公布号 US2005266692(A1) 申请公布日期 2005.12.01
申请号 US20040859328 申请日期 2004.06.01
申请人 BRASK JUSTIN K;DOYLE BRIAN S;SHAH UDAY;CHAU ROBERT S 发明人 BRASK JUSTIN K.;DOYLE BRIAN S.;SHAH UDAY;CHAU ROBERT S.
分类号 H01L21/302;H01L21/308;H01L21/311;H01L21/461;H01L21/4763;H01L21/768;(IPC1-7):H01L21/476 主分类号 H01L21/302
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