发明名称 Method for manufacturing circuit device
摘要 A method for manufacturing a circuit device, which is suitable for connecting a plurality of laminated wiring layers to each other through an insulating layer, is provided. In a method for manufacturing a hybrid integrated circuit device of the present invention, a first wring layer is formed by laminating a first conductive film on a first insulating layer, and patterning the first conductive film. In the first wiring layer, a first connection part which is protruded in a thickness direction is formed. Moreover, the first wiring layer including the first connection part is covered with a second insulating layer. The second insulating layer is formed of a first resin film and a second resin film. The second resin film contains fewer inorganic fillers than the first resin film. Thus, there is an advantage that a through-hole can be easily formed.
申请公布号 US2005263905(A1) 申请公布日期 2005.12.01
申请号 US20050138932 申请日期 2005.05.25
申请人 发明人 USUL RYOSUKE;MIZUHARA HIDEKI;IGARASHI YUSUKE;TAKAKUSAKI NOBUHISA;ABE HAYATO;NAKAMURA TAKESHI
分类号 H01L21/48;H01L23/31;H01L23/48;H01L23/498;H01L23/538;H01L25/16;H05K1/02;H05K1/05;H05K3/00;H05K3/28;H05K3/42;H05K3/46;(IPC1-7):H01L23/48 主分类号 H01L21/48
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