发明名称 METHOD FOR MANUFACTURING CONDUCTIVE WAFERS, METHOD FOR MANUFACTURING THIN-PLATE SINTERED COMPACTS, METHOD FOR MANUFACTURING CERAMIC SUBSTRATES FOR THIN-FILM MAGNETIC HEAD, AND METHOD FOR MACHINING CONDUCTIVE WAFERS
摘要 A METHOD FOR MANUFACTURING THIN-PLATE SINTERED COMPACTS ACCORDING TO THE PRESENT INVENTION INCLUDES THE STEPS OF: FORMING A CONDUCTIVE SINTERED COMPACT (10) TO HAVE SUCH A THICKNESS AS TO CAUSE A WARP TO A NEGLIGIBLE DEGREE; AND SLICING THE CONDUCTIVE SINTERED COMPACT (10), THEREBY CUTTING AND DIVIDING THE CONDUCTIVE SINTERED COMPACT INTO AT LEAST TWO WAFERS (10A, 10B).
申请公布号 MY120793(A) 申请公布日期 2005.11.30
申请号 MYPI9900190 申请日期 1999.01.16
申请人 HITACHI METALS, LTD. 发明人 MAKOTO FUKUDA;MASANORI CHIKUBA
分类号 B23H1/00;H01L21/304;B23H7/02;B23H9/00;B23H9/02;B28D1/22 主分类号 B23H1/00
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