发明名称 |
Semiconductor manufacturing apparatus and pattern formation method |
摘要 |
<p>A semiconductor manufacturing apparatus includes a liquid supplying section for supplying a liquid to be provided on a stage where a substrate having a resist film is placed; an exposing section for irradiating the resist film with exposing light through a mask with the liquid provided on the resist film on the stage; and an ionization preventing section for preventing ionization of the liquid.</p> |
申请公布号 |
EP1600815(A2) |
申请公布日期 |
2005.11.30 |
申请号 |
EP20050009722 |
申请日期 |
2005.05.03 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD |
发明人 |
ENDO, MASAYUKI;SASAGO, MASARU |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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