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发明名称
TECHNIQUE ON OZONE WATER FOR USE IN CLEANING SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
EP1541667(A4)
申请公布日期
2005.11.30
申请号
EP20030788086
申请日期
2003.08.11
申请人
SUMITOMO MITSUBISHI SILICON CORPORATION;PURETRON LTD.;ECHO GIKEN CO., LTD.
发明人
TAKEMURA, MAKOTO;FUKUDA, YASUO;HAYATA, KAZUAKI;KATO, MASAAKI;SUHARA, EIJI
分类号
C11D7/26;B08B3/02;B08B3/08;C02F1/68;C02F1/78;C11D3/39;C11D7/50;C11D7/60;C11D11/00;C11D17/08;H01L21/304;H01L21/306;H01L21/308;(IPC1-7):C11D7/26
主分类号
C11D7/26
代理机构
代理人
主权项
地址
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