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发明名称
METHOD FOR PRODUCING AN EXPOSED SUBSTRATE
摘要
<p>Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.</p>
申请公布号
EP1599763(A2)
申请公布日期
2005.11.30
申请号
EP20040713881
申请日期
2004.02.24
申请人
GIESECKE & DEVRIENT GMBH
发明人
KAULE, WITTICH
分类号
G03F7/00;G03F7/095;G03F7/20;G03H1/02;(IPC1-7):G03F7/00;G02B5/18;B42D15/00
主分类号
G03F7/00
代理机构
代理人
主权项
地址
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