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发明名称
Method for adjusting the overlay of two masking levels in a photolithographic process
摘要
申请公布号
EP1373982(B1)
申请公布日期
2005.11.30
申请号
EP20020727401
申请日期
2002.03.12
申请人
INFINEON TECHNOLOGIES AG
发明人
HASSMANN, JENS
分类号
G03F9/00;G03F7/20;H01L21/027;(IPC1-7):G03F7/20
主分类号
G03F9/00
代理机构
代理人
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