| 摘要 |
1. A method of carrying out a profile analysis of dust micro-particles located on a electrically conductive substrate by registering secondary ion currents, generated when examined micro-particles are treated with an ion beam. It is characterised in that a sample (6), in the form of a substrate containing dust micro-particles (1), is placed in an ion beam (2) of a device for profile analysis. Then, the sample (6) is rotated around the axis perpendicular to the surface of the treated sample to ensure variation of the azimuth angle of incidence of the ion beam on the sample surface during its treatment, while secondary ions are being registered. |
