SURFACE MODIFICATION OF MAGNETIC HEADS

摘要

THIS IS A PROCESS FOR THE MODIFICATION OF THE OUTERMOST ATOM LAYER OF LAYERS APPLIED TO A SUBSTRATE IN PLASMA, IN WHICH COVALENT, FIXED BONDING OF CF3 GROUPS ARE PRODUCED ON THE SUBSTRATE. THIS DOES NOT DEAL WITH THE APPLICATION OF A LAYER WITH A DEFINED THICKNESS, RATHER THE CONDITIONING OF THE SURFACE TO PREDETERMINE DESIRED PROPERTIES OF ADSORPTION AND SLIP. A MAXIMUM CHANGE IN PHYSICAL PARAMETERS TAKES PLACE AT THE SAME TIME AS A MINIMUM CHEMICAL CHANGE.