发明名称 Vacuum chamber
摘要 The invention relates to the vacuum deposition installations, meant for deposition onto the glass surface of a metal layer, namely to the vacuum chambers.The vacuum chamber contains a body, including a cylindrical lower part 1 with taps 2 and, joined with it by welding, an upper part 3, made in the form of parallelepiped, a common bottom 4, a flange 5 and a cover 6 with peephole 7. Onto the plane surfaces of the upper part 3 there are made vertical 8 and horizontal 9 and 10 stiffening ribs.The problem of the invention is solved due to the fact that the vacuum chamber is equipped with the upper part in the form of parallelepiped which permits to increase the dimensions of the glass subjected to working.
申请公布号 MD20040109(A) 申请公布日期 2005.11.30
申请号 MD20040000109 申请日期 2004.05.10
申请人 JOREANU VASILE 发明人 JOREANU VASILE
分类号 C23C16/00;(IPC1-7):C23C16/00 主分类号 C23C16/00
代理机构 代理人
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