| 发明名称 |
Lithographic apparatus and device manufacturing method. |
| 摘要 |
A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid. |
| 申请公布号 |
SG116555(A1) |
申请公布日期 |
2005.11.28 |
| 申请号 |
SG20040004063 |
申请日期 |
2004.06.08 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JOERI LOF;HANS BUTLER;SJOERD NICOLAAS LAMBERTUS DONDERS;ALEKSEY KOLESNYCHENKO;ERIK ROELOF LOOPSTRA;HENDRICUS JOHANNES MARIA MEIJER;JOHANNES CATHARINUS HUBERTUS MULKENS;ROELOF AEILKO SIEBRAND RITSEMA;FRANK VAN SCHAIK;TIMOTHEUS FRANCISCUS SENGERS;KLAUS SIMON;JOANNES THEODOOR DE SMIT;ALEXANDER STRAAIJER;BOB STREEFKERK;ERIK THEODORUS MARIA BIJLAART;CHRISTIAAN ALEXANDER HOOGENDAM;HELMAR VAN SANTEN;MARCUS ADRIANUS KERKHOF;MARK KROON;ARIE JEFFREY DEN BOEF;JOOST JEROEN OTTENS;JEROEN JOHANNES SOPHIA MARIA MERTENS |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
