PLASMA PROCESSING METHOD AND APPARATUS USING DYNAMIC SENSING OF A PLASMA ENVIRONMENT,申请号KR20010009751-传众专利搜索

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发明名称	PLASMA PROCESSING METHOD AND APPARATUS USING DYNAMIC SENSING OF A PLASMA ENVIRONMENT
摘要
申请公布号	KR100531454(B1)	申请公布日期	2005.11.28
申请号	KR20010009751	申请日期	2001.02.26
申请人		发明人
分类号	H01L21/66;H05H1/00;H01J37/32;H01L21/302;H01L21/3065;H01L21/31;H05H1/46;(IPC1-7):H01L21/66	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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