| 摘要 |
FIELD: application of coats in vacuum; manufacture of thin and superthin films from metals, semimetals, alloys, dielectrics, semiconductors and superconductors in microelectronics. ^ SUBSTANCE: for application of coats, use is made of at least two plasma generators whose cathodes consist of many substances intended for forming the coats. Each generator is adjusted to definite voltage in accordance with percentage of each coat to be applied. In applying the longitudinal magnetic field on area of each vacuum arc, use is made of magnetic plug so that maximum magnitude of magnetic field Hmax of magnetic plug coincides with area of cathode spots and minimum magnitude of magnetic field Hmin of magnetic plug coincides with anode area of pulse vacuum arc. During transportation of plasma flux in form of shift potential U1 of body of each plasma duct, use is made of anode surge of DeltaUa potential of respective pulse vacuum arc. At mixing of at least two pulse fluxes of plasma, use is made of anode surges DeltaUa as shift potential of anode areas of respective pulse vacuum arcs; to this ends, peripheral force lines of magnetic field of each magnetic plug located in near-anode area are used as well as peripheral force lines of solenoid of each plasma duct. ^ EFFECT: increased productivity by more than 100 times at simultaneous reduction of power requirements. ^ 74 cl, 28 dwg |
