APPARATUS AND METHOD FOR PROVIDING FLUID FOR IMMERSION LITHOGRAPHY
摘要
An apparatus and method are disclosed for providing fluid for immersion lithography. Immersion fluid is injected into an inner cavity in a direction that is different than a direction in which the nozzle moves. The immersion fluid can also be injected at different rates into the inner cavity at different sides. A wafer substrate is then exposed by light through the immersion fluid.
申请公布号
WO2005111722(A2)
申请公布日期
2005.11.24
申请号
WO2005US14200
申请日期
2005.04.27
申请人
NIKON CORPORATION;POON, ALEX, KA, TIM;KHO, LEONARD, WAI, FUNG