发明名称 Semiconductor device and manufacture method thereof
摘要 The problem is to provide a technology to reduce a light leakage current in order to obtain a good display. One kind or plurality kinds of elements chosen from argon, germanium, silicon, helium, neon, krypton, and xenon are implanted in a crystalline semiconductor layer, to distribute crystal defects due to the aforementioned element implantation by uniform and suitable density in the semiconductor film, making recombination centers of carriers, to thereby suppress alight sensitivity without spoiling a high degree of carrier movement included in a crystalline semiconductor layer.
申请公布号 US2005258421(A1) 申请公布日期 2005.11.24
申请号 US20030406591 申请日期 2003.04.04
申请人 SHIBATA HIROSHI;NAKAMURA OSAMU;NAKA SHUNICHI;UEDA TOHRU 发明人 SHIBATA HIROSHI;NAKAMURA OSAMU;NAKA SHUNICHI;UEDA TOHRU
分类号 G02F1/1368;H01L21/20;H01L21/322;H01L21/336;H01L21/77;H01L29/04;H01L29/786;(IPC1-7):H01L29/04 主分类号 G02F1/1368
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