| 发明名称 |
Mask blank having a protection layer |
| 摘要 |
A mask blank and photomask for exposure light having a wavelength of 300 nm or is less described having an improved chemical durability in particular with respect to alkaline cleaning procedures. In particular, a mask blank and photomask comprise an additional ultra thin protection layer provided on a silicon and/or aluminum containing layer.
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| 申请公布号 |
US2005260504(A1) |
申请公布日期 |
2005.11.24 |
| 申请号 |
US20050101654 |
申请日期 |
2005.04.08 |
| 申请人 |
BECKER HANS;BUTTGEREIT UTE;HESS GUENTER;GOETZBERGER OLIVER;SCHMIDT FRANK;SOBEL FRANK;RENNO MARKUS |
发明人 |
BECKER HANS;BUTTGEREIT UTE;HESS GUENTER;GOETZBERGER OLIVER;SCHMIDT FRANK;SOBEL FRANK;RENNO MARKUS |
| 分类号 |
G03F1/00;G03F1/08;G03F1/16;(IPC1-7):G03F1/16 |
主分类号 |
G03F1/00 |
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