发明名称 EFFECTS OF METHODS OF MANUFACTURING SPUTTERING TARGETS ON CHARACTERISTICS OF COATINGS
摘要 Titanium and aluminum cathode targets are disclosed for sputtering absorbing coatings of titanium and aluminum-containing materials in atmospheres comprising inert gas, reactive gases such as nitrogen, oxygen, and mixtures thereof, which can further comprise inert gas, such as argon, to form nitrides, oxides, and oxynitrides, as well as metallic films. The titanium and aluminum-containing coatings can be utilized as an outer coat or as one or more coating layers of a coating stack.
申请公布号 WO2005111257(A2) 申请公布日期 2005.11.24
申请号 WO2005US14486 申请日期 2005.04.27
申请人 PPG INDUSTRIES OHIO, INC. 发明人 FINLEY, JAMES J.;BUHAY, HARRY
分类号 C03C17/09;C03C17/22;C03C17/27;C03C17/36;C23C14/00;C23C14/06;C23C14/08;C23C14/18;C23C14/32;C23C14/34 主分类号 C03C17/09
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