发明名称 APPARATUS AND METHOD FOR DETOXIFYING EXHAUST GAS, AND SYSTEM FOR MANUFACTURING ELECTRONIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide an apparatus for detoxifying exhaust gas whose detoxification rate of exhaust gas is improved and to provide a method for detoxifying exhaust gas, and a system for manufacturing an electronic device. <P>SOLUTION: The detoxification apparatus 100 for detoxifying the exhaust gas to be discharged from a semiconductor treatment apparatus 90 is provided with: an exhaust pipe 10 through which the exhaust gas discharged from the semiconductor treatment apparatus 90 is made to flow; a first scrubber 21 connected to the exhaust pipe 10 for detoxifying a harmful component in the exhaust gas; a reaction cylinder 30; a second scrubber 22; an outlet water scrubber 23; and a heater control unit 50 for controlling the heat-treatment temperature in the reaction cylinder 30 by a feedforward system on the basis of the treatment condition of the semiconductor treatment apparatus 90. <P>COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005324102(A) 申请公布日期 2005.11.24
申请号 JP20040143434 申请日期 2004.05.13
申请人 SEIKO EPSON CORP 发明人 ONO MICHITERU
分类号 B01D53/70;B01D53/48;B01D53/68;B01D53/77;B01D53/86 主分类号 B01D53/70
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