发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To prevent ultraviolet rays for hardening a sealing agent from entering a light receiving surface and deteriorating characteristics of a solid-state imaging element, and also to prevent the intrusion of a flowed-out sealing agent into the light receiving surface by uniformly irradiating the ultraviolet rays on a portion which needs be irradiated with the ultravilet rays. SOLUTION: Between a package 4 and the emission end 12 of an optical fiber 11, a metallic lightproof mask 10 is formed. In the lightproof mask 10, a plurality of through holes 15 are formed to allow ultraviolet rays to pass through only necessary parts and then incident into the package 4. By changing sizes of the through holes 15 according as the ultraviolet rays are irradiated, a variation in illuminance can be eliminated. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2005327801(A) 申请公布日期 2005.11.24
申请号 JP20040142479 申请日期 2004.05.12
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 OSAKI HIROTO
分类号 H01L21/56;(IPC1-7):H01L21/56 主分类号 H01L21/56
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