发明名称 |
Treating a semiconductor wafer comprises using a system held by rollers which hold the wafer in a region of their edges so that an etching medium flows against the edge of the wafer |
摘要 |
<p>Treating a semiconductor wafer comprises using a system held by rollers which hold the wafer in a region of their edges so that an etching medium flows against the edge of the wafer. A shaft is connected to one end of the rollers and both ends of the shaft are spaced at 2 cm from each other. An independent claim is also included for a device for treating a semiconductor wafer comprising a system of rollers and a protective screen placed in front of the edge of the wafer.</p> |
申请公布号 |
DE102005028166(A1) |
申请公布日期 |
2005.11.24 |
申请号 |
DE20051028166 |
申请日期 |
2005.06.17 |
申请人 |
SILTRONIC AG |
发明人 |
BIRKHORST, PETER;KOECKEIS, RUPERT;SCHWAB, GUENTER;STADLER, MAXIMILIAN |
分类号 |
C30B33/08;H01L21/00;H01L21/306;(IPC1-7):C30B33/08 |
主分类号 |
C30B33/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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