发明名称 Treating a semiconductor wafer comprises using a system held by rollers which hold the wafer in a region of their edges so that an etching medium flows against the edge of the wafer
摘要 <p>Treating a semiconductor wafer comprises using a system held by rollers which hold the wafer in a region of their edges so that an etching medium flows against the edge of the wafer. A shaft is connected to one end of the rollers and both ends of the shaft are spaced at 2 cm from each other. An independent claim is also included for a device for treating a semiconductor wafer comprising a system of rollers and a protective screen placed in front of the edge of the wafer.</p>
申请公布号 DE102005028166(A1) 申请公布日期 2005.11.24
申请号 DE20051028166 申请日期 2005.06.17
申请人 SILTRONIC AG 发明人 BIRKHORST, PETER;KOECKEIS, RUPERT;SCHWAB, GUENTER;STADLER, MAXIMILIAN
分类号 C30B33/08;H01L21/00;H01L21/306;(IPC1-7):C30B33/08 主分类号 C30B33/08
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